OPTICS FOR SCANNING: Multilayer collector mirrors enable next-generation EUV lithography

Extreme-ultraviolet lithography is likely to be the next-generation technology to achieve 22 nm resolution and beyond, but sufficient source power must be provided to enable high stage-scanning speed and throughput.

Mar 1st, 2009
Th 311902

Extreme-ultraviolet lithography is likely to be the next-generation technology to achieve 22 nm resolution and beyond, but sufficient source power must be provided to enable high stage-scanning speed and throughput. Multilayer collector mirrors are enabling these needed higher-power sources. Nigel Farrar, David Brandt, and Norbert Böwering of Cymer

www.laserfocusworld.com/articles/353552

Click here to enlarge image

null

More in Optics