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Laser Technology News 2002 p1:

• DuPont Displays and UDC Form OLED Alliance
  Wilmington, DE and Ewing, NJ, December 13, 2002. DuPont Displays and Universal Display Corporation have agreed to create a new generation of soluble OLED materials and technology. UDC and DuPont have also executed a cross-license agreement, under which DuPont will make an initial payment to UDC and pay UDC a running royalty for products sold that utilize UDC's background
• Worldwide MEMS/MST Market To Cross $26B By 2007
  Norwalk, CT, December 5, 2002. Micro-electro-mechanical systems (MEMS) and Micro-systems (MST) together represent one of the fastest growing technology areas. Sales volumes of MEMS products will soon approach nearly 10% of those of the semiconductor industry. This growth rate has been achieved in less than ten years, and the MEMS industry has proven to be an enabling technology in several key economic sectors such as telecommunications and healthcare.
• SOPRA and Sumitomo Partner on Excimer Annealing System
  Bois Columbes, France, December 4, 2002. Marc Stehle, president of SOPRA S.A. and Yoshio Hinoh, president of Sumitomo Heavy Industry, Ltd. (Tokyo, Japan) have signed a license agreement for the manufacturing and sales of Excimer Laser Annealing Systems based on SOPRA VEL laser technology. The license makes the High-Pulse-Energy Excimer Laser technology available for Low Temperature Poly-Silicon (LTPS) mass production required display manufacturing
• OIF Approves Four Implementation Agreements
  Fremont, CA, November 21, 2002. The Optical Internetworking Forum (OIF) has adopted four Physical and Link Layer (PLL) Implementation Agreements (IA) for tunable lasers, SFI-4, Phase 2, VSR4-05 and VSR5. The approval of the four IAs brings the total number of IAs approved by the OIF in 2002 to a record eight. The Physical and Link Layer Working Group (PLL WG) approved the formation of the Common Electrical I/O (CEI) project at the quarterly technical committee meeting held in Orlando
• StockerYale to Offer Polarization Maintaining Fiber
  Salem, NH, November 14, 2002 StockerYale, Inc. has announced the availability of Bow-tie polarization maintaining fiber. This fiber is the first in a series of polarization maintaining fibers to be released by the Company and are specifically designed for use in fiber optic gyroscopes, (FOGS), voltage and current sensors, high-data-rate communications systems, laser pigtailing, connectivity between source lasers and modulators, and polarization-sensitive components.
• US Navy Deploys Largest Federal Solar Electric System
  San Diego, CA, November 13, 2002. Navy Region Southwest announced today that it has deployed the largest federal solar photovoltaic system in the nation. This system is a unique solar electric carport at Naval Base Coronado in San Diego, which makes innovative use of existing parking space. The installation is comprised of two contiguous solar arrays, covering a half-mile long parking structure that serves US Navy personnel.
• Kodak Contracts on NIMA Softcopy Search Program
  Rochester, NY, November 4, 2002 -- The National Imagery and Mapping Agency (NIMA), has chosen Eastman Kodak Company as a prime contractor on their Softcopy Search project, designed to provide a more efficient and effective way to detect changes of significance in large imagery datasets.
• UC Davis Wins Grant for Biophotonics Center
  Davis, CA October 29, 2002 -- Using lasers, light, and radiant energy in biology and medicine is the aim of a new collaborative center established at the University of California, Davis.
• Near-Field Optics Pioneer Founds NANOPTEK
  Concord, MA, October 16, 2002 -- John M. Guerra, the inventor of photon tunneling microscopy (PTM) and other near-field technology, has founded NANOPTEK Corp. to develop and commercialize nano- and near-field optical technology and instrumentation.
• Corning Awarded Patent for Microlithography Lens Blank
  Corning, NY, October 11, 2002. -- Corning Incorporated has received a U.S. patent for a calcium fluoride (CaF2) lens blank that supports the advancement of CaF2 materials for the 193nm and 157nm microlithography systems. CaF2 represents the next-generation optical material for semiconductor manufacturing applications.

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