MIDDLEFIELD, CT--The Optical Systems Division of Zygo (Nasdaq: ZIGO) has been awarded a contract valued in excess of $9 million with the College of Nanoscale Science and Engineering (CNSE) of the University at Albany and the SEMATECH consortium of chipmakers to develop extreme ultraviolet (EUV) lithography optics to be incorporated into the next, fifth generation Micro-Exposure Tool (MET-5) at CNSE's Albany NanoTech Complex. The MET-5 program is being managed by the SEMATECH consortium.
The MET-5 program is intended to aid researchers in extending semiconductor lithography resolution capability to less than 16 nm. This is in support of EUV resist and EUV mask developments intended to meet the international technology roadmap for semiconductors and associated decreasing linewidths. Advanced development and production is expected to take place over a 22-month period and will be carried out by Zygo's Extreme Precision Optics operation in Richmond, CA.
Chris Koliopoulos, Zygo President and CEO, stated, "Development of the next generation Micro-Exposure Tool represents an important milestone for Zygo and further solidifies Zygo's position as a key supplier of EUV components. We are also very pleased to be working closely with CNSE and SEMATECH and its members to push the boundaries of photolithography technology to new, extreme levels."
SOURCE: Zygo
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