• ArF light source from Cymer designed for 14 nm chip manufacturing

    The XLR 700ix argon fluoride immersion light source provides bandwidth control of 300 ± 5 fm to eliminate a source of process variation.
    March 3, 2015

    The XLR 700ix argon fluoride immersion light source for advanced 14 nm chip manufacturing provides bandwidth control of 300 ± 5 fm to eliminate a source of process variation. Improved bandwidth, wavelength, and energy stability allow high scanner throughput and process stability. The source uses half the helium of previous models, with 15% less power consumption.
    Cymer
    San Diego, CA
    www.cymer.com

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