Nikon and A*STAR to set up joint R&D lab for advanced 193-nm lithography technology

Singapore--Semiconductor-research specialist A*STAR Institute of Microelectronics (IME) and Nikon Corporation (Tokyo, Japan) will be setting up an R&D laboratory in Singapore to develop advanced optical-lithography technology for the 193 nm argon fluoride (ArF) excimer-laser wavelength. The intent is to push semiconductor-chip geometries down below 20 nm.

Nikon and IME will extend ArF deep-ultraviolet (DUV) dry and immersion lithography by further developing multiple patterning and directed self-assembly techniques. The partners hope to use the technology to make more-advanced logic, high-density memory, embedded non-volatile memory, high-speed electronics and nanophotonics, and nano-electromechanical systems (NEMS). Nikon has been in the optical lithographic equipment market since the 1980s.

Optical lithography at 193 nm has been around for years and is used, for example, in the production of Intel's current 22 nm Ivy Bridge CPU chips. Going much below 22 nm in feature size is a challenge, although Intel is aiming to hit 14 nm in 2014. When conventional 193 nm lithography optics is used, the idea will be to apply further photoresist and exposure tricks (multiple exposures and so on), relying on the nonlinear properties of resist to give a boost to what amounts to superresolution techniques.

Nikon and IME's other approach -- directed self-assembly -- is a radical departure from conventional lithography; in this technique, nanosized building blocks (such as nanospheres) are made to assemble to create the photomask required for exposure. This is called a "bottom-up" technique, as opposed to conventional lithography's "top-down" approach.

The main challenger to Nikon and IME's research effort will be extreme UV (EUV) lithography, which is now in the R&D stage; it uses light at a 14 nm wavelength and precision mirrored optics to greatly increase optical resolution in a straightforward way (in other words, not relying on nonlinear resist effects). Cymer (San Diego, CA) is developing the light source and ASML (Veldhoven, The Netherlands) the scanning and exposure equipment for this approach (in fact, ASML is buying Cymer). Nikon is also involved in developing EUV systems.




Get All the Laser Focus World News Delivered to Your Inbox

Subscribe to Laser Focus World Magazine or email newsletter today at no cost and receive the latest news and information.

 Subscribe Now

Most Popular Articles

White Papers

Tamarisk® Custom Lens Calibration

Though the Tamarisk product line is optimally designed to suit a variety of end-uses, DRS has dev...

DRS Technologies’ Patented Sensor Technology Revealed

Learn the truth about what’s behind DRS Technologies’ competitive advantage over thermal sensor m...

NIST Traceable Spectral Responsivity Calibration of Photodiode Detectors

All Newport optical detectors are recommended for a 12 month recalibration interval. Newport main...
Technical Digests

Fiber for Fiber Lasers

The development of higher-power and higher-energy fiber lasers has benefited from many advances i...

SCANNERS FOR MATERIALS PROCESSING: Serving demanding applications

Galvanometer-based scanners are an essential component in laser-based materials-processing system...

Click here to have your products listed in the Laser Focus World Buyers Guide.

PRESS RELEASES

NanoZoomer SQ

03/06/2015 NanoZoomer SQ is Hamamatsu’s new desktop single slide scanner for creating Whole Slide Images of ...

HORIBA Scientific Releases New LabSpec 6 MultiWell Module

01/30/2015 HORIBA Scientific, global leader in Raman spectroscopy systems, announces the release of a new Mu...

ATS 200: The first alignment turning station with fully integrated measurement technology

01/23/2015 The ATS 200 combines a compact and highly stable turning lathe with TRIOPTICS' proven centration ...

OptiSpheric® IOL PRO 2

01/23/2015 TRIOPTICS successfully presented the OptiSpheric® IOL PRO 2 for measurements of IOL lenses at the...
Social Activity
  •  
  •  
  •  
  •  
Copyright © 2007-2014. PennWell Corporation, Tulsa, OK. All Rights Reserved. PRIVACY POLICY | TERMS AND CONDITIONS