San Jose, CA--Photolithography and laser-processing equipment systems manufacturer Ultratech acquired the assets of Cambridge Nanotech (Cambridge, MA), a provider of atomic layer deposition (ALD) solutions with hundreds of system installations in research and manufacturing settings worldwide. Financial terms of the transaction were not disclosed. With this acquisition, Ultratech expands its nanophotonics technology and intellectual property (IP) portfolio with ALD technology to provide solutions for new layers within the electronics industry and entry into new markets, such as biomedical and energy.
Due to the increasing interest in nanoscience, ALD has emerged as a critical photonics technology for depositing precise nanometer-thin films. Typical applications of ALD require the manufacture of very precise nanometer-thin, pinhole-free and conformal thin films on many shapes and geometries. As a result, this technology will be in high demand in volume manufacturing environments and in particular for micro-electro-mechanical systems (MEMs), implantable devices in the biomedical sector, and batteries and fuel cells in the energy arena. Ultratech says ALD is an enabling technology and provides coatings and material features with significant advantages to other existing techniques, expanding the presence of Ultratech in fields outside its traditional semiconductor and high-brightness LED markets.
Ultratech chairman and CEO Arthur W. Zafiropoulo said, "As a global leader in experimental ALD solutions, Cambridge has developed a portfolio of valuable technology and systems. We plan to integrate the intellectual property acquired from Cambridge Nanotech into Ultratech and include the ALD systems in our nanotechnology product group. By increasing our IP and expanding our nanotechnology portfolio to new levels, we expect to generate a new revenue stream in existing and new markets. We have focused on technology solutions and support our global customer operations. We expect that this acquisition will enhance our short-term as well as our long-term growth expectations."
Ultratech notes that these forward-looking statements are based on management's current beliefs and expectations, some or all of which may prove to be inaccurate, and which may change. Ultratech undertakes no obligation to revise or update any forward-looking statements to reflect any event or circumstance that may arise after the date of this release.
Founded in 1979, Ultratech says its lithography products deliver high throughput and production yields at a low, overall cost of ownership for bump packaging of integrated circuits and high-brightness LEDs (HB-LEDs). A pioneer of laser processing, Ultratech developed laser spike anneal technology, which increases device yield, improves transistor performance and enables the progression of Moore's Law for 32-nm and below production of state-of-the-art consumer electronics.
SOURCE: Ultratech; http://ir.ultratech.com/releasedetail.cfm?ReleaseID=727937