The extreme ultraviolet (EUV) projection optics for 14 nm resolution, or ETIK, has been launched by the German Ministry of Education and Research (BMBF)and is led by Carl Zeiss. The aim is to improve EUV lithography resolution to the 14-nm node for semiconductor manufacturing.
The BMBF is putting up 7 million euros over 3 years for the project. Project partners will focus on the EUV illumination system and projection optics.
Six other German companies and research institutes will participate:
- Bestec is developing machine concepts for a new generation of reflectometers to measure the EUV reflectivity of large mirror surfaces.
- The Institute for Technical Optics (University Stuttgart) is developing flexible setting measuring technology for mirrors with a new type of surface geometry.
- IMS CHIPS is contributing powerful optical components to ensure the quality of the projection lens.
- The Fraunhofer institutes for Electron Beam and Plasma Technology (FEP), for Applied Optics and Precision Engineering (IOF), and for Material and Beam Technology (IWS) are providing scientific-technical services to further improve the surface quality of reflective optical components.
For more information on the project, read this article in our sister publication, Solid State Technology.