Adoption of 193-nm lithography seen by 2003

As the semiconductor industry strives to move beyond 100-nm feature boundaries, the cycle for optical lithographic technology is expected to evolve from a market of early adopters of 193-nm technology in 2001 into a more general mass-market adoption in 2003. This conclusion is the result of the reported industry consensus of more than 150 lithography tool manufacturers, material suppliers, and chipmakers who gathered last December at the eighth annual industry symposium �The Road to 100 nm and Beyond.� The symposium, cohosted by Cymer (San Diego, CA) and Seiko Instruments Inc. (Chiba, Japan), was held in conjunction with SEMICON Japan 2000.

Identifiable trends also showed that both krypton fluoride (KrF) and argon fluoride (ArF) technology are being deployed at the 130-nm wavelength and that ArF is the preferred technology for 100-nm applications. In addition, production issues associated with calcium fluoride (CaF2) at 193 nm were analyzed with plans to resolve them within the next 12 months.

�The symposium provided an excellent opportunity for leading lithography experts and chipmakers to come together to discuss the challenges facing the lithography community and developments to date,� noted David Brandt, Cymer's senior director of marketing.

Specific presentation topics included a general market overview and roadmap for the lithography arena; the challenges facing chipmakers in the industry environment; KrF and resolution-enhancement techniques for lithography applications; and future plans for ArF. Presenters included representatives from Samsung (Seoul, Korea), Hitachi Ltd. (Tokyo, Japan), Mitsubishi Electric Corp. (Tokyo, Japan), Intel Corp. (Santa Clara, CA), and Cymer.

The symposium emphasized the latest developments in light-source technology, including a presentation on Cymer's fourth-generation extreme-ultraviolet technology design based on dense plasma focus, which was delivered by Igor Fomenkov, a member of Cymer's technical staff. A panel discussion was also held to address the obstacles and hurdles of ArF lithography applications. The panel, which was facilitated by Tohru Ogawa, (Sony Corp; Tokyo, Japan), included representatives from ASML (Veldhoven, The Netherlands), Canon Inc. (Tokyo, Japan), DuPont Photomask (Round Rock, TX), Nikon (Tokyo, Japan), Schott ML GmbH (Mainz, Germany), Tokyo Ohka Kogyo Co. (Tokyo, Japan), and Cymer.

Hassaun A. Jones-Bey, Senior Editor

Get All the Laser Focus World News Delivered to Your Inbox

Subscribe to Laser Focus World Magazine or email newsletter today at no cost and receive the latest news and information.

 Subscribe Now

Most Popular Articles


Understanding Polarization and Optical Coatings

Light is an electromagnetic wave, but, at optical frequencies, it is its electric field that interacts with materials, with the direction of the electric fie...

Wave Optics Simulations

An add-on to COMSOL Multiphysics®, the Wave Optics Module offers capabilities for modeling optical phenomena. The innovative beam envelope method is among th...

Lens Design – Tools for designing manufacturable aspheres for complex optical assemblies

Designing aspheres that may be successfully fabricated and tested can be a frustrating experience. The range of possible aspheres is much larger than the ran...

Ray Optics Simulations with COMSOL Multiphysics

The Ray Optics Module can be used to simulate electromagnetic wave propagation when the wavelength is much smaller than the smallest geometric entity in the ...
White Papers

High-Power Diode Lasers under External Optical Feedback

We carried out a comprehensive study on single emitters with different antireflection (AR) coatin...

LED Reflector and Lens Simulation using TracePro® Illumination Design and Analysis Software

TracePro® allows users to design, analyze, and optimize LED lighting systems using software simul...

Degradation studies of a VECSEL gain structure using a stable green pump laser

The degradation of the gain structure of a red-emitting Optically Pumped Semiconductor (OPS) Vert...
Technical Digests

Fiber for Fiber Lasers

The development of higher-power and higher-energy fiber lasers has benefited from many advances i...

Click here to have your products listed in the Laser Focus World Buyers Guide.


Synopsys' CODE V Version 10.4 is now generally available

03/30/2012 Synopsys' CODE V Enhances Analysis of Precision Optical Systems.

Scratch-resistant mirror with gold surface

03/12/2012 In the LINOS catalog from Qioptiq you will now find the scratch-resistant mirror with gold surface.
Social Activity
Copyright © 2007-2014. PennWell Corporation, Tulsa, OK. All Rights Reserved. PRIVACY POLICY | TERMS AND CONDITIONS