Adoption of 193-nm lithography seen by 2003

As the semiconductor industry strives to move beyond 100-nm feature boundaries, the cycle for optical lithographic technology is expected to evolve from a market of early adopters of 193-nm technology in 2001 into a more general mass-market adoption in 2003. This conclusion is the result of the reported industry consensus of more than 150 lithography tool manufacturers, material suppliers, and chipmakers who gathered last December at the eighth annual industry symposium �The Road to 100 nm and Beyond.� The symposium, cohosted by Cymer (San Diego, CA) and Seiko Instruments Inc. (Chiba, Japan), was held in conjunction with SEMICON Japan 2000.

Identifiable trends also showed that both krypton fluoride (KrF) and argon fluoride (ArF) technology are being deployed at the 130-nm wavelength and that ArF is the preferred technology for 100-nm applications. In addition, production issues associated with calcium fluoride (CaF2) at 193 nm were analyzed with plans to resolve them within the next 12 months.

�The symposium provided an excellent opportunity for leading lithography experts and chipmakers to come together to discuss the challenges facing the lithography community and developments to date,� noted David Brandt, Cymer's senior director of marketing.

Specific presentation topics included a general market overview and roadmap for the lithography arena; the challenges facing chipmakers in the industry environment; KrF and resolution-enhancement techniques for lithography applications; and future plans for ArF. Presenters included representatives from Samsung (Seoul, Korea), Hitachi Ltd. (Tokyo, Japan), Mitsubishi Electric Corp. (Tokyo, Japan), Intel Corp. (Santa Clara, CA), and Cymer.

The symposium emphasized the latest developments in light-source technology, including a presentation on Cymer's fourth-generation extreme-ultraviolet technology design based on dense plasma focus, which was delivered by Igor Fomenkov, a member of Cymer's technical staff. A panel discussion was also held to address the obstacles and hurdles of ArF lithography applications. The panel, which was facilitated by Tohru Ogawa, (Sony Corp; Tokyo, Japan), included representatives from ASML (Veldhoven, The Netherlands), Canon Inc. (Tokyo, Japan), DuPont Photomask (Round Rock, TX), Nikon (Tokyo, Japan), Schott ML GmbH (Mainz, Germany), Tokyo Ohka Kogyo Co. (Tokyo, Japan), and Cymer.

Hassaun A. Jones-Bey, Senior Editor

Most Popular Articles

Webcasts

Handheld Spectrometers

Spectroscopy can be a powerful measurement tool, and handheld spectrometers offer the ultimate in portability, so the instrument can be applied wherever meas...

Fracking, climate change, and lasers:  new tools to reduce fugitive methane emissions

This webcast, sponsored by Hamamatsu Corporation, covers recent developments and field deployments of compact quantum-cascade-laser (QCL)-based methane senso...

Opportunities in the Mid-IR

The technology for exploiting the mid-IR is developing rapidly:  it includes quantum-cascade lasers and other sources, spectroscopic instruments of many...

Fiber Optic Sensors – Fundamentals, Principles and Applications

In this webcast, sponsored by Nufern, we focus on optical fiber sensing technology.  Fundamental concepts will be presented first, followed by the under...
Technical Digests

Keeping pace with developments in Raman spectroscopy for molecular and nanoparticle research

For demanding or custom spectroscopy solutions, care must be taken in selecting and integrating a...
Sponsored by

HIGH-POWER FIBER LASERS: Working in the kilowatt regime

High-power materials-processing fiber lasers are available in an increasing variety of forms, as ...
Sponsored by

Click here to have your products listed in the Laser Focus World Buyers Guide.

RELATED PRODUCTS

Laser Beamsteering Mirrors

First choice for all mirror applications: Optics Balzers designs and produces flat mirr...

Fluorescence Filter Sets

Optics Balzers fluorescence filter sets include excitation and emission filters (bandpa...

Westech Finite Conjugate Lenses

Finite conjugate lenses offer a large angle of coverage, high limiting resolution and a...

RELATED COMPANIES

Technodiamant USA Inc

Manufactures quality diamond tools including "Controlled Waviness" tools for precision ...

CVI Laser Optics

Provides solutions for semiconductor, biotechnology, materials processing and basic res...

Cirrus Photonics LLC

Provides innovative light source and optical systems solutions to address demanding tec...
Social Activity
  •  
  •  
  •  
  •  
  •  
Copyright © 2007-2014. PennWell Corporation, Tulsa, OK. All Rights Reserved.PRIVACY POLICY | TERMS AND CONDITIONS